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2 edition of Proceedings of the fourth Symposium on Plasma Processing found in the catalog.

Proceedings of the fourth Symposium on Plasma Processing

Symposium on Plasma Processing. (4th 1983 San Francisco, Calif.)

Proceedings of the fourth Symposium on Plasma Processing

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Published by Dielectrics and Insulation and Electronics Divisions, Electrochemical Society in Pennington, NJ (10 S. Main St., Pennington 08534-2896) .
Written in English

    Subjects:
  • Plasma engineering -- Congresses.

  • Edition Notes

    Includes bibliographical references and indexes.

    Statementedited by G.S. Mathad, G.C. Schwartz, G. Smolinsky.
    SeriesProceedings / The Electrochemical Society -- v. 83-10, Proceedings (Electrochemical Society) -- v. 83-10.
    ContributionsMathad, G. S., Schwartz, G. C., Smolinsky, G.
    Classifications
    LC ClassificationsTA2005 .S95 1983
    The Physical Object
    Paginationx, 649 p. :
    Number of Pages649
    ID Numbers
    Open LibraryOL22468808M

    Advances in Vacuum Science and Technology, Proceedings, 1st International Congress on Vacuum Techniques (Vol. II) Pergamon Press: Oxford: English: Thomas, E. Advances in Vacuum Science and Technology, Proceedings, 1st International Congress on Vacuum Techniques (Vol. I) Namur: Belgium: English: Thomson, J.J. The Discharge of. Where avai lable, links to the meeting program, abstract titles, or online abstracts are provided below each listing. Please contact the AACR Program Development Department at or [email protected] for more information on a specific conference or to order a copy of the conference proceedings (limited supplies, print only). Process,” Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces(UCPSS’98), Abstract Book, pp. , Ostende, Belgium, September E (P) H. Morita, J. Ida, T. Mizuniwa and T. Ohmi, “Hydrogenated Ultrapure Water Procuction System for Future Wet Cleaning Process,” Edited by M. Heyns. Characterization of high-K dielectric ZrO 2 films annealed by rapid thermal processing Journal of Vacuum Science & Technology B: Proceedings of the Fourth International Symposium on the Physics and Chemistry of SiO 2 and the Si–SiO 2 Interface (), p. Cited by:

    About these proceedings Introduction After earlier meetings in Enschede (NL, ), Basel (CH, ) and Banff (CDN, ), muTAS is the fourth international symposium on the subject of miniaturized techniques, methods, devices and .


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Proceedings of the fourth Symposium on Plasma Processing by Symposium on Plasma Processing. (4th 1983 San Francisco, Calif.) Download PDF EPUB FB2

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